Extreme Ultraviolet Lithography
by: Banqiu Wu, Ajay Kumar
Abstract: Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.
Full details
Table of Contents
- A. Foreword
- B. Preface
- 1. Introduction
- 2. Exposure System
- 3. EUV Sources
- 4. EUV Optics
- 5. Multilayer Interference Coatings for EUVL
- 6. EUV Metrology
- 7. EUV Photoresist
- 8. EUVL Masks
- A. About the Authors
Tools & Media
Expanded Table of Contents
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A.
Foreword
-
B.
Preface
- 1. Introduction
-
2.
Exposure System
- Introduction: Extreme Ultraviolet Lithography (EUVL), Extension of Optical Lithography
- EUVL-Specific Challenges
- EUVL System Performance Predictions
- EUVL Systems Overview
- Detailed Analysis and Performance Characterization of an EUVL Microstepper
- Pupil-Fill Control in EUVL
- Flare
- Optical Components for EUVL
- 3. EUV Sources
- 4. EUV Optics
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5.
Multilayer Interference Coatings for EUVL
- Overview and History of Multilayer Coatings in EUVL
- Main Requirements for EUVL Coatings
- Design of EUV Multilayer Coatings
- Multilayer Deposition Technologies
- Imperfections in Mo/Si Multilayer Mirrors
- Interface-Engineered Mo/Si Coatings
- Stability of Mo/Si Coatings
- Stress Reduction in Mo/Si Coatings
- Concluding Remarks
- Acknowledgments
- 6. EUV Metrology
- 7. EUV Photoresist
- 8. EUVL Masks
-
A.
About the Authors
Book Details
Title: Extreme Ultraviolet Lithography
Publisher: : New York, Chicago, San Francisco, Lisbon, London, Madrid, Mexico City, Milan, New Delhi, San Juan, Seoul, Singapore, Sydney, Toronto
Copyright / Pub. Date: 2009 The McGraw-Hill Companies, Inc.
ISBN: 9780071549189
Authors:
Banqiu Wu , Ph.D., is Chief Technology Officer, Mask Products Division, Applied Materials,
Inc.
Ajay Kumar is the author of this McGraw-Hill Professional publication.
Description: Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.
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