Extreme Ultraviolet Lithography

by: Banqiu Wu, Ajay Kumar


Abstract: Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.
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Book Details

Title: Extreme Ultraviolet Lithography

Publisher: : New York, Chicago, San Francisco, Lisbon, London, Madrid, Mexico City, Milan, New Delhi, San Juan, Seoul, Singapore, Sydney, Toronto

Copyright / Pub. Date: 2009 The McGraw-Hill Companies, Inc.

ISBN: 9780071549189

Authors:

Banqiu Wu , Ph.D., is Chief Technology Officer, Mask Products Division, Applied Materials, Inc.

Ajay Kumar is the author of this McGraw-Hill Professional publication.

Description: Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.